发明名称 POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, HARDENING FILM FORMATION METHOD, HARDENING FILM, LIQUID CRYSTAL DISPLAY DEVICE AND ORGANIC EL DISPLAY DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To provide a positive photosensitive resin composition which has high sensitivity and high thermal stability and with which a hardening film with low organic solvent swelling rate can be formed. <P>SOLUTION: A positive photosensitive resin composition includes (component A) resin including constitutional units expressed by the formula (1) and constitutional units having carboxy groups or phenol hydroxyl groups protected by acetal or ketal, (component B) acid generator, and (component C) solvent. In the formula (1), R<SP POS="POST">1</SP>means a hydrogen atom or an alkyl group, L<SP POS="POST">1</SP>means a bivalent connection group and L<SP POS="POST">2</SP>means a trivalent hydrocarbon group. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012008223(A) 申请公布日期 2012.01.12
申请号 JP20100141974 申请日期 2010.06.22
申请人 FUJIFILM CORP 发明人 YAMADA SATORU;MAZAKI YOSHIHISA
分类号 G03F7/039;C08F220/26;G03F7/004 主分类号 G03F7/039
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