发明名称 MULTI-TONE PHOTOMASK, PHOTOMASK BLANK FOR MULTI-TONE PHOTOMASK, AND PATTERN TRANSFER METHOD
摘要 <P>PROBLEM TO BE SOLVED: To more surely prevent a semi-translucent film from being etched. <P>SOLUTION: A light shielding part is formed by laminating the semi-translucent film, an etching stopper film, and a light shielding film in this order on a transparent substrate, and a semi-translucent part is formed by forming the semi-translucent film on the transparent substrate, and a translucent part is formed by exposing the transparent substrate, and the etching stopper film has a film thickness being 1.5 or more times as thick as a surface roughness of the semi-translucent film. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012008219(A) 申请公布日期 2012.01.12
申请号 JP20100141932 申请日期 2010.06.22
申请人 HOYA CORP 发明人 NAGASHIMA SHO;YAMAGUCHI NOBORU
分类号 G03F1/68 主分类号 G03F1/68
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