发明名称 |
LITHOGRAPHIC APPARATUS, CONTROL SYSTEM AND DEVICE MANUFACTURING METHOD |
摘要 |
An immersion lithographic apparatus is disclosed that has a measurement system or a prediction system for measuring and/or predicting, respectively, an effect associated with a temperature fluctuation of the immersion liquid, and a control system for controlling the or another effect associated with the temperature of the immersion liquid, on the basis of the measurement and/or prediction obtained by the measurement system and/or prediction system, respectively. An associated control system and device manufacturing method is also disclosed. |
申请公布号 |
US2012008113(A1) |
申请公布日期 |
2012.01.12 |
申请号 |
US201113238861 |
申请日期 |
2011.09.21 |
申请人 |
VAN DE KERKHOF MARCUS ADRIANUS;JACOBS JOHNNES HENRICUS WILHELMUS;UITTERDIJK TAMMO;LALLEMANT NICOLAS ALBAN;ASML NETHERLANDS B.V. |
发明人 |
VAN DE KERKHOF MARCUS ADRIANUS;JACOBS JOHNNES HENRICUS WILHELMUS;UITTERDIJK TAMMO;LALLEMANT NICOLAS ALBAN |
分类号 |
G03B27/52 |
主分类号 |
G03B27/52 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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