| 摘要 |
According to one embodiment, a method is disclosed for manufacturing a semiconductor memory device. The method can include forming a plurality of protruding portions in band configurations on a major surface of a semiconductor layer to extend along a first direction parallel to the major surface. The method can include forming an inter-layer insulating film to cover the protruding portions and an inner surface of a trench between the protruding portions. The method can include forming a buried conductive portion by filling a first conductive material into a space inside the trench. The method can include exposing a buried conductive portion side surface by dividing the buried conductive portion along the first direction. The method can include filling a second conductive material into a void of the buried conductive portion exposed at the side surface. In addition, the method can include removing one portion of the second conductive material. |
