| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an etchant for copper oxide and an etching method, wherein when copper oxide, particularly CuO (II), as a thermal reaction type resist material is exposed to a laser beam, the etchant can selectively etch the exposed and unexposed parts thereof. <P>SOLUTION: A copper oxide-containing layer essentially comprising copper oxide is etched with an etchant at least containing either an acid or a chelating agent and a surfactant containing a phosphoric ester moiety. <P>COPYRIGHT: (C)2012,JPO&INPIT |
