CHARGED PARTICLE BEAM WRITING APPARATUS AND CONTROL METHOD THEREOF

摘要

PURPOSE: A charged particle beam writing apparatus and a control method thereof are provided to reduce a transmission time of data to a distributor while reducing the whole load of the distributor. CONSTITUTION: A pattern area density distribution calculation part(10b1c) calculates a first pattern area density distribution used for optical proximity correction projection calculation. The optical proximity correction projection calculation unit(10b1d) calculates the optical proximity correction projection based on the first pattern area density distribution. A flow correction projection calculation unit(10b1e) calculates the flow correction projection based on the optical proximity correction projection. A first distributor(10b1b1) writes out first blocks by unit data used for shot segmentation.