| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an actinic ray-sensitive or radiation-sensitive resin composition having sufficient resolution to give a perpendicular side wall when a contact hole pattern is formed, capable of maintaining a wide EDW (exposure defocus window), and having improved side lobe durability and a reduced number of blob defects. <P>SOLUTION: An active ray-sensitive or radiation-sensitive resin composition contains (A) a resin whose solubility in an alkali developing solution is increased by an action of an acid, (B) a compound which generates an acid upon irradiation with actinic rays or radiation, and (C) a basic compound expressed by general formula (IV). In the general formula, R<SB POS="POST">21</SB>, R<SB POS="POST">22</SB>, R<SB POS="POST">23</SB>, R<SB POS="POST">24</SB>each independently represent a hydrogen atom, an alkyl group, an alkoxy group or an aralkyl group; X represents a hydrogen atom, an alkyl group or an aryl group; and Z represents a heterocyclic group. <P>COPYRIGHT: (C)2012,JPO&INPIT |
