| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a manufacturing method of a substrate having patterns, capable of controlling the interval of adjacent film patterns and controlling the widths of the film patterns to form particularly thick patterns with a small width; a manufacturing method of a substrate having a highly-electromotive conduction film with little variation in antenna inductance; and a manufacturing method of a semiconductor device with a high yield. <P>SOLUTION: Film patterns are formed by forming a film in which silicon and oxygen are coupled and an inactive group is coupled with the silicon on a substrate and an insulation or conduction film, printing a composition by a printing method on a surface of the film in which silicon and oxygen are coupled and the inactive group is coupled with the silicon, and then baking the composition. <P>COPYRIGHT: (C)2012,JPO&INPIT |
