SUBSTRATE STAGE, SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING SYSTEM

摘要

PURPOSE: A substrate stage, a substrate processing apparatus and a substrate processing system are provided to perform a temperature management of the surface of a substrate accurately by adjusting a gap between the peripheral part and a system substrate. CONSTITUTION: A board loading stand(20) is arranged within a process chamber(10). A protrusion(30) is installed in the top side of the board loading stand. A plurality of support pins(28) supporting the substrate(W) are installed in the process chamber An elevating mechanism(29) raises the support pin up and down and is comprised of a driving part(29a) and a lifting unit(29b). A periphery loading member(40) loads a substrate rim part(W1). A center loading member(50) loads a substrate central part(W2).