发明名称 METAL CONTACT SCHEME FOR SOLAR CELLS
摘要 <p>A method of forming point metal electrical contacts to a semiconductor surface of a semiconductor device is provided. In a first step a first metal layer is formed over the semiconductor surface. The first metal layer is then anodised to create a porous metal-oxide layer formed over the semiconductor surface. The pores in the porous metal-oxide layer will thus form an array of openings in the porous metal-oxide layer. A contact metal layer is then formed over the porous metal-oxide layer such that parts of the contact metal layer extend into openings of the array of openings. The contact metal layer electrically contacts the semiconductor surface through the array of openings in the porous metal-oxide layer. A dielectric layer may optionally be formed over the semiconductor surface and the porous metal-oxide layer the formed over the dielectric layer and the contact metal then contacts the semiconductor surface through the dielectric layer.</p>
申请公布号 WO2012000015(A1) 申请公布日期 2012.01.05
申请号 WO2011AU00586 申请日期 2011.05.17
申请人 NEWSOUTH INNOVATIONS PTY LIMITED;LENNON, ALISON JOAN;LU, DORIS;CHEN, YANG 发明人 LENNON, ALISON JOAN;LU, DORIS;CHEN, YANG
分类号 H01L21/44;H01L21/28 主分类号 H01L21/44
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