| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a pattern inspection device capable of detecting a size error in a fine pattern. <P>SOLUTION: A pattern inspection device includes: an image acquisition part 10 for imaging a sample with a pattern formed thereon based on design data; a development image generation part 22 for generating a development image, based on the design data; and a reference image generation part 24 for inputting the development image to a reference image generation model and generating a reference image, and also for optimizing a model parameter so as to minimize a difference in gradation values of pixels between an inspected image and the reference image. A measurement value of an inspected pattern in one of the reference image and the inspected image is corrected through the use of a conversion difference of a reference pattern obtained from a measurement value of the reference pattern in the reference image and a measurement value of the reference pattern in the inspected image. The corrected measurement value of the inspected pattern in the reference image is compared with the measurement value of the inspected pattern in the inspected image, so as to detect existence of a defect. <P>COPYRIGHT: (C)2012,JPO&INPIT |
