发明名称 FABRICATION METHOD OF GRAPHENE FILMS USING PHYSICAL VAPOR DEPOSITION TECHNIQUES
摘要 PURPOSE: A method of manufacturing a graphene film using physical vapor deposition techniques is provided to form a grapheme film by heat-treating a carbon film with a general rapid heat-treatment device. CONSTITUTION: A method of manufacturing a graphene film using physical vapor deposition techniques comprises steps of preparing a metal film on a substrate, metal foil, or a metal substrate(30), forming a carbon film on the metal film, the metal foil, or the metal substrate through physical vapor deposition, and heat-treating the carbon film to form a grapheme film(100). The metal film, metal foil, or metal substrate is made from the combination of one or more selected from the group consisting of Ni, Co, Fe, Cu, Ru, Pt, Pd, Ta, Mo, W, Ir, Ti, V, Mn, Al, Mg, and transition metal including Zn.
申请公布号 KR20120001121(A) 申请公布日期 2012.01.04
申请号 KR20100061759 申请日期 2010.06.29
申请人 KOREA ELECTROTECHNOLOGY RESEARCH INSTITUTE 发明人 CHOO, SEONG JAE;BAHNG, WOOK
分类号 C23C14/06;C23C14/46;C23C14/58 主分类号 C23C14/06
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