发明名称 |
Photosensitive composition, pattern forming material, and photosensitive film, pattern forming method, pattern film, low refractive index film, optical device and solid-state imaging device each using the same |
摘要 |
A photosensitive composition contains (A) a hollow or porous particle, (B) a compound capable of generating an active species upon irradiation with an actinic ray or radiation, and (C) a compound capable of changing in the solubility for an alkali developer by the action of the active species. |
申请公布号 |
EP2402818(A1) |
申请公布日期 |
2012.01.04 |
申请号 |
EP20110172113 |
申请日期 |
2011.06.30 |
申请人 |
FUJIFILM CORPORATION |
发明人 |
SAIE, TOSHIYUKI;WADA, KENJI;MAKINO, MASAOMI;TOMEBA, HISAMITSU;YOSHIBAYASHI, MITSUJI |
分类号 |
G03F7/00;G03F7/004;G03F7/09 |
主分类号 |
G03F7/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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