发明名称 Photosensitive composition, pattern forming material, and photosensitive film, pattern forming method, pattern film, low refractive index film, optical device and solid-state imaging device each using the same
摘要 A photosensitive composition contains (A) a hollow or porous particle, (B) a compound capable of generating an active species upon irradiation with an actinic ray or radiation, and (C) a compound capable of changing in the solubility for an alkali developer by the action of the active species.
申请公布号 EP2402818(A1) 申请公布日期 2012.01.04
申请号 EP20110172113 申请日期 2011.06.30
申请人 FUJIFILM CORPORATION 发明人 SAIE, TOSHIYUKI;WADA, KENJI;MAKINO, MASAOMI;TOMEBA, HISAMITSU;YOSHIBAYASHI, MITSUJI
分类号 G03F7/00;G03F7/004;G03F7/09 主分类号 G03F7/00
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