发明名称 REACTIVE ION ETCHING APPARATUS AND TEXTURING METHOD FOR SOLARCELL USING SAME
摘要 PURPOSE: A reactive ion etching apparatus and a method for texturing a solar battery using the same are provided to enhance efficiency of texturing by executing chemical etch and physical etch with a single process and forming a complex etching structure on the surface of the solar battery. CONSTITUTION: A thin film is evaporated on the substrate of a solar battery. The thin film is composed of SiO2. The thickness of a thin film which is evaporated is more than 3000Å. A pattern is transferred on the upper side of the thin film. The thin film is isotropically etched using a transferred pattern as mask. The thin film is anisotropically etched using the transferred pattern as mask. Isotropic etching and anisotropic etching are executed in a reactive ion etching apparatus.
申请公布号 KR20120001274(A) 申请公布日期 2012.01.04
申请号 KR20100061984 申请日期 2010.06.29
申请人 KOREA POLYTECHNIC UNIVERSITY INDUSTRY ACADEMIC COOPERATION FOUNDATION 发明人 LEE, HEE CHUL;KIM, HYUNG SOO
分类号 H01L31/04 主分类号 H01L31/04
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