发明名称 |
REACTIVE ION ETCHING APPARATUS AND TEXTURING METHOD FOR SOLARCELL USING SAME |
摘要 |
PURPOSE: A reactive ion etching apparatus and a method for texturing a solar battery using the same are provided to enhance efficiency of texturing by executing chemical etch and physical etch with a single process and forming a complex etching structure on the surface of the solar battery. CONSTITUTION: A thin film is evaporated on the substrate of a solar battery. The thin film is composed of SiO2. The thickness of a thin film which is evaporated is more than 3000Å. A pattern is transferred on the upper side of the thin film. The thin film is isotropically etched using a transferred pattern as mask. The thin film is anisotropically etched using the transferred pattern as mask. Isotropic etching and anisotropic etching are executed in a reactive ion etching apparatus. |
申请公布号 |
KR20120001274(A) |
申请公布日期 |
2012.01.04 |
申请号 |
KR20100061984 |
申请日期 |
2010.06.29 |
申请人 |
KOREA POLYTECHNIC UNIVERSITY INDUSTRY ACADEMIC COOPERATION FOUNDATION |
发明人 |
LEE, HEE CHUL;KIM, HYUNG SOO |
分类号 |
H01L31/04 |
主分类号 |
H01L31/04 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|