| 发明名称 |
SPUTTERING TARGET, OXIDE SEMICONDUCTOR FILM AND SEMICONDUCTOR DEVICE |
| 摘要 |
A sputtering target including an oxide sintered body, the oxide sintered body containing indium (In) and at least one element selected from gadolinium (Gd), dysprosium (Dy), holmium (Ho), erbium (Er) and ytterbium (Yb), and the oxide sintered body substantially being of a bixbyite structure.
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| 申请公布号 |
US2011315936(A1) |
申请公布日期 |
2011.12.29 |
| 申请号 |
US20080532247 |
申请日期 |
2008.02.28 |
| 申请人 |
INOUE KAZUYOSHI;YANO KOKI;KASAMI MASASHI;IDEMITSU KOSAN CO., LTD. |
发明人 |
INOUE KAZUYOSHI;YANO KOKI;KASAMI MASASHI |
| 分类号 |
C01F17/00;C01B35/00;C01F5/00;C01F7/02;C01G15/00;C01G51/04;C01G53/04;C23C14/34;H01B1/08 |
主分类号 |
C01F17/00 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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