| 摘要 |
<p>FERROMAGNETIC MATERIAL SPUTTERING TARGETA ferromagnetic material sputtering target made of metal having a composition containing 20 mol% or less of Cr, and Co as the remainder thereof, wherein the structure of the target includes a metallic substrate (A), and, in the metallic substrate (A), a spherical phase (B) containing 90 wt% or more of Co in which the difference between the longest diameter and the shortest diameter is 0 to 50%, Provided is a ferromagnetic material sputtering target capable of improving the leakage magnetic flux to obtain a stable electrical discharge with a magnetronI0? sputtering device.Fig. 1</p> |
