| 摘要 |
<p>PURPOSE: A lithographic apparatus and methods are provided to clean a material on the top of a substrate table or the limited area of the substrate table. CONSTITUTION: In a lithographic apparatus and methods, the top surface of a substrate table comprises a recess(20) in which a sensor(100) is installed. Seal is arranged in the gap between the edge of the recess and the edge of the sensor. The seal prevents immersion liquid from being flowed into the gap. The regions of the substrate surrounding the sensor include UV sense coating. The regions(130,140,150) include two marks respectively.</p> |
