发明名称 Test structures for development of metal-insulator-metal (MIM) devices
摘要 In the present electronic test structure comprising, a conductor is provided, overlying a substrate. An electronic device overlies a portion of the conductor and includes a first electrode connected to the conductor, a second electrode, and an insulating layer between the first and second electrodes. A portion of the conductor is exposed for access thereto.
申请公布号 US8084770(B2) 申请公布日期 2011.12.27
申请号 US20080313089 申请日期 2008.11.17
申请人 AVANZINO STEVEN;PANGRLE SUZETTE K.;RATHOR MANUJ;CHEN AN;HADDAD SAMEER;TRIPSAS NICHOLAS;BUYNOSKI MATTHEW;SPANSION LLC 发明人 AVANZINO STEVEN;PANGRLE SUZETTE K.;RATHOR MANUJ;CHEN AN;HADDAD SAMEER;TRIPSAS NICHOLAS;BUYNOSKI MATTHEW
分类号 H01L29/10 主分类号 H01L29/10
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