发明名称 |
THIN FILM THICKNESS CONTROL DEPOSITION SYSTEM FOR IMPROVING THIN FILM UNIFORMITY |
摘要 |
PURPOSE: A thin film deposition apparatus for improve the accuracy of the thickness control of a thin film is provided to allow a measurement sensor to accurately monitor and measure the injection amount of deposition materials. CONSTITUTION: A thin film deposition apparatus for improve the accuracy of the thickness control of a thin film comprises a distribution pipe(103), multiple injection nozzles(104), one or more measurement nozzles(204), nozzle caps, a measurement sensor(207), and a chopper. The distribution pipe has multiple inlets. The injection nozzles are connected to the inlets of the distribution pipe and inject deposition materials in a direction. The measurement nozzles inject deposition materials in the other direction. The nozzle caps are detachably formed in the injection nozzles. The measurement sensor is formed in a horizontal line to the measurement nozzles. The chopper is formed between the measurement nozzles and the measurement sensor and controls the flow rate of the deposition materials.
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申请公布号 |
KR101097593(B1) |
申请公布日期 |
2011.12.22 |
申请号 |
KR20110021786 |
申请日期 |
2011.03.11 |
申请人 |
SUNIC SYSTEM. LTD. |
发明人 |
HWANG, IN HO;KIM, SUN HYUK;YANG, HO SIK;CHOI, JAE SOO |
分类号 |
C23C14/24;C23C14/54;G01B11/06 |
主分类号 |
C23C14/24 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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