发明名称 THIN FILM THICKNESS CONTROL DEPOSITION SYSTEM FOR IMPROVING THIN FILM UNIFORMITY
摘要 PURPOSE: A thin film deposition apparatus for improve the accuracy of the thickness control of a thin film is provided to allow a measurement sensor to accurately monitor and measure the injection amount of deposition materials. CONSTITUTION: A thin film deposition apparatus for improve the accuracy of the thickness control of a thin film comprises a distribution pipe(103), multiple injection nozzles(104), one or more measurement nozzles(204), nozzle caps, a measurement sensor(207), and a chopper. The distribution pipe has multiple inlets. The injection nozzles are connected to the inlets of the distribution pipe and inject deposition materials in a direction. The measurement nozzles inject deposition materials in the other direction. The nozzle caps are detachably formed in the injection nozzles. The measurement sensor is formed in a horizontal line to the measurement nozzles. The chopper is formed between the measurement nozzles and the measurement sensor and controls the flow rate of the deposition materials.
申请公布号 KR101097593(B1) 申请公布日期 2011.12.22
申请号 KR20110021786 申请日期 2011.03.11
申请人 SUNIC SYSTEM. LTD. 发明人 HWANG, IN HO;KIM, SUN HYUK;YANG, HO SIK;CHOI, JAE SOO
分类号 C23C14/24;C23C14/54;G01B11/06 主分类号 C23C14/24
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