发明名称 Liquid wiping apparatus
摘要 A liquid wiping apparatus that can eliminate the increase in the thickness of membranous liquid and defects in the surface quality resulting from the attachment of splash onto the surface of a metallic strip and can improve the productivity in a manner of accelerating the line speed is provided. The liquid wiping apparatus includes blade wipers for contacting with a molten metal having been attached onto the metallic strip 1 to mechanically wipe the molten metal. In the liquid wiping apparatus, a pressure applying unit 7 of the static pressure pad type using gas is installed at the outlet side of the blade wiper 6 in the strip running direction, and phase-mixed flow of gas/liquid 15 is produced in membranous liquid running between the blade wiper 6 and the strip 1.
申请公布号 US8079323(B2) 申请公布日期 2011.12.20
申请号 US20080081020 申请日期 2008.04.09
申请人 YOSHIKAWA MASASHI;HIRANO TATSUYA;FUJIOKA HIRONORI;NAGAI TAKANORI;MITSUBISHI-HITACHI METALS MACHINERY, INC. 发明人 YOSHIKAWA MASASHI;HIRANO TATSUYA;FUJIOKA HIRONORI;NAGAI TAKANORI
分类号 B05C11/06;C23C2/22;C23C2/20 主分类号 B05C11/06
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