| 摘要 |
A semiconductor device includes: a bulk semiconductor substrate; a thyristor formed in the bulk semiconductor substrate; a gate electrode formed at the third region; and a well region. The thyristor included a first region of a first conduction type, a second region of a second conduction type opposite to the first conduction type, a third region of the first conduction type, and a fourth region of the second conduction type, junctioned in order. The well region of the second conduction type is formed in the bulk semiconductor substrate, the third region is formed in the well region. A first voltage is impressed on the first region side of the thyristor, a second voltage higher than the first voltage is impressed on the fourth region side of the thyristor, and a voltage higher than or equal to the first voltage is impressed on the well region. |
