| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a resist trimming method capable of highly accurately controlling dimension by performing resist trimming at a low trimming speed. <P>SOLUTION: The resist trimming method includes: a plasma generation step of generating plasma of a reaction gas; a removing step of removing ions and electrons from the generated plasma to selectively extract a radical; and a trimming step of trimming a resist pattern by irradiating the plasma, from which the ions and the electrons have been removed, to the resist pattern. <P>COPYRIGHT: (C)2012,JPO&INPIT |
