发明名称 VERFAHREN ZUM HERSTELLEN VON MULTIKRISTALLINEN SILIZIUM-SOLARZELLEN DES N-TYPS
摘要 <p>The invention provides solar cells and methods of manufacturing solar cells having a Hetero-junction with Intrinsic Thin-layer (HIT) structure using an n-type multicrystalline silicon substrate. An n-type multicrystalline silicon substrate is subjected to a phosphorus diffusion step using a relatively high temperature. The front side diffusion layer is then removed. As a next step, a p-type silicon thin film is deposited at the front side of the substrate. This sequence avoids heating the p-type silicon thin film above its deposition temperature, and maintains the quality of the p-type silicon thin film.</p>
申请公布号 AT537562(T) 申请公布日期 2011.12.15
申请号 AT20060799532T 申请日期 2006.10.04
申请人 STICHTING ENERGIEONDERZOEK CENTRUM NEDERLAND 发明人 KOMATSU, YUJI;GOLDBACH, HANNO;SCHROPP, RUDOLF;GEERLIGS, LAMBERT
分类号 H01L31/0747;H01L31/18 主分类号 H01L31/0747
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