发明名称 COMPOUND SEMICONDUCTOR FILM VAPOR PHASE GROWTH SUSCEPTOR AND COMPOUND SEMICONDUCTOR FILM FORMING METHOD
摘要 <P>PROBLEM TO BE SOLVED: To provide a compound semiconductor film vapor phase growth susceptor suitable for the vapor phase growth of a compound semiconductor film which can reduce a difference of an element, for example, a luminous element produced from near an end portion of a substrate from a luminous element produced from a central portion of the substrate because the former does not exhibit a long emission wavelength, that is, which can reduce a difference in characteristics between elements produced from the central and the peripheral portion of the substrate. <P>SOLUTION: A susceptor is used to hold a substrate during a vapor phase growth of a compound semiconductor film. The susceptor of the present invention includes at least one or more of a countersunk section in which the substrate is to be placed. The countersunk section is curved in conical form on a bottom face at the base thereof, with the concave portion of the curved section adapted to be 250 to 500 &mu;m in maximum depth. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2011254015(A) 申请公布日期 2011.12.15
申请号 JP20100128144 申请日期 2010.06.03
申请人 SHIN ETSU HANDOTAI CO LTD 发明人 TAKAHASHI MASANORI;SAKAI KENJI;SUZUKI YUKARI
分类号 H01L21/205;C23C16/458;H01L21/683 主分类号 H01L21/205
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