| 摘要 |
PURPOSE: A capacitive coupling plasma reactor is provided to perform discharging between two electrodes which are installed by combining, thereby generating plasma. CONSTITUTION: A plasma reactor(10) comprises a reactor body(11), a gas supply part(20), and a second electrode plate(30). The reactor body comprises a substrate support stand(12) supporting a processed substrate(13) in the inside. The gas supply part supplies gas to the reactor body with a first electrode. The second electrode plate discharges plasma to the inside of the reactor body. The lower part of the reactor body is connected to an exhaust pump(8). The substrate support stand is connected to a bias power supply source(46). The gas supply part arranges the ceiling of the reactor body. The gas supply part induces the capacitive coupled plasma between the second electrode plate connected to a power supply source(40). |
