发明名称 HOT PLATE FOR HOT EMBOSSING NANO IMPRINTING LITHOGRAPHY APPARATUS
摘要 <p>PURPOSE: A thermal plate apparatus for a high temperature-embossing nano imprint lithography apparatus is provided to improve the accuracy of an imprint pattern structure by spirally arranging a heating tube and a cooling pipe. CONSTITUTION: Top and bottom thermal plate heats and cools a substrate. A thermal plate main body(10) has an empty internal space. A heating tube(21) is arranged in an internal space of the thermal plate main body and heats the substrate. A cooling tube(31) is arranged in the internal space of the thermal plate main body and cools the substrate. A transport unit(40) transfers one of the heating pipe and the cooling pipe to be closer to the substrate than the other one.</p>
申请公布号 KR101093285(B1) 申请公布日期 2011.12.14
申请号 KR20100075151 申请日期 2010.08.04
申请人 SOONCHUNHYANG UNIVERSITY INDUSTRY ACADEMY COOPERATION FOUNDATION 发明人 KIM, KUG WEON;JUN, SANG BUM
分类号 H01L21/027 主分类号 H01L21/027
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