发明名称 |
HOT PLATE FOR HOT EMBOSSING NANO IMPRINTING LITHOGRAPHY APPARATUS |
摘要 |
<p>PURPOSE: A thermal plate apparatus for a high temperature-embossing nano imprint lithography apparatus is provided to improve the accuracy of an imprint pattern structure by spirally arranging a heating tube and a cooling pipe. CONSTITUTION: Top and bottom thermal plate heats and cools a substrate. A thermal plate main body(10) has an empty internal space. A heating tube(21) is arranged in an internal space of the thermal plate main body and heats the substrate. A cooling tube(31) is arranged in the internal space of the thermal plate main body and cools the substrate. A transport unit(40) transfers one of the heating pipe and the cooling pipe to be closer to the substrate than the other one.</p> |
申请公布号 |
KR101093285(B1) |
申请公布日期 |
2011.12.14 |
申请号 |
KR20100075151 |
申请日期 |
2010.08.04 |
申请人 |
SOONCHUNHYANG UNIVERSITY INDUSTRY ACADEMY COOPERATION FOUNDATION |
发明人 |
KIM, KUG WEON;JUN, SANG BUM |
分类号 |
H01L21/027 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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