发明名称 |
Apparatus for annealing, method for annealing, and method for manufacturing a semiconductor device |
摘要 |
An apparatus for annealing a substrate includes a substrate stage having a substrate mounting portion configured to mount the substrate; a heat source having a plurality of heaters disposed under the substrate mounting portion, the heaters individually preheating a plurality areas defined laterally in the substrate through a bottom surface of the substrate; and a light source facing a top surface of the substrate, configured to irradiate a pulsed light at a pulse width of about 0.1 ms to about 100 ms on the entire top surface of the substrate. |
申请公布号 |
US8076226(B2) |
申请公布日期 |
2011.12.13 |
申请号 |
US20080232443 |
申请日期 |
2008.09.17 |
申请人 |
ITO TAKAYUKI;KABUSHIKI KAISHA TOSHIBA |
发明人 |
ITO TAKAYUKI |
分类号 |
H01L21/04 |
主分类号 |
H01L21/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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