发明名称 |
Gas flow equalizer plate suitable for use in a substrate process chamber |
摘要 |
A flow equalizer plate is provided for use in a substrate process chamber. The flow equalizer plate has an annular shape with a flow obstructing inner region, and a perforated outer region that permits the passage of a processing gas, but retains specific elements in the processing gas, such as active radicals or ions. The inner and outer regions have varying radial widths so as to balance a flow of processing gas over a surface of a substrate. In certain embodiments, the flow equalizer plate may be utilized to correct chamber flow asymmetries due to a lateral offset of an exhaust port relative to a center line of a substrate support between the process volume and the exhaust port. |
申请公布号 |
US8075728(B2) |
申请公布日期 |
2011.12.13 |
申请号 |
US20080038887 |
申请日期 |
2008.02.28 |
申请人 |
BALAKRISHNA AJIT;RAUF SHAHID;NGUYEN ANDREW;WILLWERTH MICHAEL D.;TODOROW VALENTIN N.;APPLIED MATERIALS, INC. |
发明人 |
BALAKRISHNA AJIT;RAUF SHAHID;NGUYEN ANDREW;WILLWERTH MICHAEL D.;TODOROW VALENTIN N. |
分类号 |
C23F1/00;C23C16/06;C23C16/22;C23C16/455;H01L21/306 |
主分类号 |
C23F1/00 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|