发明名称 |
SUBSTRATE PROCESSING APPARATUS |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a substrate processing apparatus which prevents its transfer device from degrading detection accuracy in an accelerating region. <P>SOLUTION: A transmission type optical sensor for detecting a wafer is mounted in horizontally outward direction on a transfer device. The transmission type optical sensor is constituted in such a manner that light emitted from a light projecting element to the wafer and transmitting the wafer is received by a light receiving element. The transmission type optical sensor is connected to a PLC which is connected to a servomotor of a transfer elevator. The PLC detects the position of the wafer in a pod according to a wafer detecting signal from the transmission type optical sensor and according to a position signal of the transfer elevator. The PLC also decides a uniform speed region of the transfer device when it moves upwardly/downwardly against the pod according to rotation speed signal from the servomotor. <P>COPYRIGHT: (C)2012,JPO&INPIT |
申请公布号 |
JP2011249642(A) |
申请公布日期 |
2011.12.08 |
申请号 |
JP20100122605 |
申请日期 |
2010.05.28 |
申请人 |
HITACHI KOKUSAI ELECTRIC INC |
发明人 |
OSAKA AKIHIRO;KAGAYA TORU;NOGAMI TAKASHI;KIMURA KAZUHIRO |
分类号 |
H01L21/677 |
主分类号 |
H01L21/677 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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