发明名称 SUBSTRATE PROCESSING APPARATUS
摘要 <P>PROBLEM TO BE SOLVED: To provide a substrate processing apparatus which prevents its transfer device from degrading detection accuracy in an accelerating region. <P>SOLUTION: A transmission type optical sensor for detecting a wafer is mounted in horizontally outward direction on a transfer device. The transmission type optical sensor is constituted in such a manner that light emitted from a light projecting element to the wafer and transmitting the wafer is received by a light receiving element. The transmission type optical sensor is connected to a PLC which is connected to a servomotor of a transfer elevator. The PLC detects the position of the wafer in a pod according to a wafer detecting signal from the transmission type optical sensor and according to a position signal of the transfer elevator. The PLC also decides a uniform speed region of the transfer device when it moves upwardly/downwardly against the pod according to rotation speed signal from the servomotor. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2011249642(A) 申请公布日期 2011.12.08
申请号 JP20100122605 申请日期 2010.05.28
申请人 HITACHI KOKUSAI ELECTRIC INC 发明人 OSAKA AKIHIRO;KAGAYA TORU;NOGAMI TAKASHI;KIMURA KAZUHIRO
分类号 H01L21/677 主分类号 H01L21/677
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