| 摘要 |
Example embodiments relate to an SRAM device and a method of manufacturing the same. The SRAM device may include first transistors operating in a horizontal direction and second transistors that are disposed on the first transistors to operate in a vertical direction. In example embodiments, the second transistors may be vertically connected to the first transistors. In example embodiments, the second transistors may be vertical transistors that include vertical gates surrounding vertical channels. |
