Composition for metal electroplating comprising leveling agent

摘要

A composition comprising a source of metal ions and at least one leveling agent comprising a linear or branched, polymeric imidazolium compound comprising the structural unit of formula L1
wherein
R 1 , R 2 , R 3
are each independently selected from an H atom and an organic radical having from 1 to 20 carbon atoms,
R 4
is a divalent, trivalent or mutlivalent organic radical which does not comprise a hydroxyl group in the ± or ² position relative to the nitrogen atom of the imidazole rings.
n
is an integer.