发明名称 |
Debris mitigation system and lithographic apparatus |
摘要 |
A debris mitigation system for trapping contaminant material coming from a debris-generating radiation source. The system includes a contamination barrier constructed and arranged to rotate about an axis, and a magnet structure constructed and arranged to provide a magnetic field for deflecting charged debris from the radiation source. The magnet structure is constructed and arranged to provide a magnetic field through the contamination barrier. The magnetic field, when passing through the contamination barrier, is oriented along planes generally coinciding with the axis of rotation of the contamination barrier.
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申请公布号 |
US8071963(B2) |
申请公布日期 |
2011.12.06 |
申请号 |
US20060645809 |
申请日期 |
2006.12.27 |
申请人 |
VAN HERPEN MAARTEN MARINUS JOHANNES WILHELMUS;KLUNDER DERK JAN WILFRED;SOER WOUTER ANTHON;GIELISSEN KURT;ASML NETHERLANDS B.V.;KONINKLIJKE PHILIPS ELECTRONICS N.V. |
发明人 |
VAN HERPEN MAARTEN MARINUS JOHANNES WILHELMUS;KLUNDER DERK JAN WILFRED;SOER WOUTER ANTHON;GIELISSEN KURT |
分类号 |
G21G5/00 |
主分类号 |
G21G5/00 |
代理机构 |
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代理人 |
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地址 |
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