发明名称 Debris mitigation system and lithographic apparatus
摘要 A debris mitigation system for trapping contaminant material coming from a debris-generating radiation source. The system includes a contamination barrier constructed and arranged to rotate about an axis, and a magnet structure constructed and arranged to provide a magnetic field for deflecting charged debris from the radiation source. The magnet structure is constructed and arranged to provide a magnetic field through the contamination barrier. The magnetic field, when passing through the contamination barrier, is oriented along planes generally coinciding with the axis of rotation of the contamination barrier.
申请公布号 US8071963(B2) 申请公布日期 2011.12.06
申请号 US20060645809 申请日期 2006.12.27
申请人 VAN HERPEN MAARTEN MARINUS JOHANNES WILHELMUS;KLUNDER DERK JAN WILFRED;SOER WOUTER ANTHON;GIELISSEN KURT;ASML NETHERLANDS B.V.;KONINKLIJKE PHILIPS ELECTRONICS N.V. 发明人 VAN HERPEN MAARTEN MARINUS JOHANNES WILHELMUS;KLUNDER DERK JAN WILFRED;SOER WOUTER ANTHON;GIELISSEN KURT
分类号 G21G5/00 主分类号 G21G5/00
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