| 摘要 |
<P>PROBLEM TO BE SOLVED: To increase a stability of a meniscus while reducing flaws such as a possibility of creating a bubble or releasing a droplet. <P>SOLUTION: A lithographic apparatus includes a fluid handling structure configured to contain an immersion fluid in a space adjacent to an upper surface of a substrate table and/or a substrate located in a recess of the substrate table, a cover having a planar main body that, in use, extends around the substrate from the upper surface to a peripheral section of an upper major face of the substrate in order to cover a gap between an edge of the recess and an edge of the substrate, and an immersion fluid film disruptor, configured to disrupt formation of a film of the immersion fluid between an edge of the cover and the immersion fluid contained by the fluid handling structure during movement of the substrate table relative to the fluid handling structure. <P>COPYRIGHT: (C)2012,JPO&INPIT |
