| 摘要 |
<P>PROBLEM TO BE SOLVED: To enable a light-shielding film to fully exhibit its original function even if dusts such as residues of a resist film adhere on a transparent substrate in forming a light-shielding pattern. <P>SOLUTION: A resist film 2 is formed on a surface of a transparent substrate 1 (b), and the resist film 2 is patterned (c). A protrusion 1a is formed on the transparent substrate 1 by etching the transparent substrate 1 with use of the resist film 2 remaining on the transparent substrate 1 as a mask (d). The resist film 2 remaining on the protrusion 1a is removed, and the surface of the transparent substrate 1 is cleaned (e). A light-shielding film 4 is formed on the surface of the transparent substrate 1 (g). By polishing at least the light-shielding film 4, the light-shielding film 4 and the protrusion 1a are flattened with the protrusion 1a being exposed (i). Thereby, the light-shielding film 4 is formed on the transparent substrate 1, after the surface of the transparent substrate 1 is cleaned with the resist film 2 on the transparent substrate 1 being completely removed. <P>COPYRIGHT: (C)2012,JPO&INPIT |
