| 摘要 |
<p>A positive resist composition comprises (A) a compound capable of generating sulfonic acid, bis(alkylsulfonyl)amide, or tris(alkylsulfonyl)methine upon irradiation with actinic ray or radiation, and (B) a resin capable of increasing the solubility in an alkali developer by action of an acid having specific repeating units, and a pattern forming method using the same.</p> |
