发明名称 Manufacturing method of photoelectric conversion device
摘要 <p>A noise generated by a constitution of widening an incident aperture of light of a photoelectric conversion element is reduced. In a manufacturing method of a photoelectric conversion device, first electroconductor arranged in a first hole arranged in the first interlayer insulation layer electrically connects a first semiconductor region to a gate electrode of an amplifying MOS transistor not through wirings included in a wiring layer. Moreover, a second electroconductor electrically connects a second semiconductor region different from the first semiconductor region to a wiring. In a constitution of that second electroconductor, a third electroconductor arranged in a second hole arranged in the first interlayer insulation layer and a fourth electroconductor arranged in a third hole arranged in the second interlayer insulation layer are stacked and electrically connected to each other. And the step of forming the first electroconductor, and the step of forming the third electroconductor are performed simultaneously. </p>
申请公布号 EP1895591(A3) 申请公布日期 2011.11.30
申请号 EP20070114764 申请日期 2007.08.22
申请人 CANON KABUSHIKI KAISHA 发明人 OKAGAWA, TAKASHI;NARUSE, HIROAKI;YUZURIHARA, HIROSHI;NISHIMURA, SHIGERU;AOKI, TAKESHI;FUJINO, YUYA
分类号 H01L27/146;H01L31/10;H04N5/335;H04N5/357;H04N5/374 主分类号 H01L27/146
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