| 发明名称 |
Lithographic apparatus, device manufacturing method and computer program product |
| 摘要 |
Additional vibrations are added during the exposure of a substrate so that vibrations occurring during exposure of a plurality of areas on the substrate are substantially uniform. This may improve CD uniformity. |
| 申请公布号 |
US8068210(B2) |
申请公布日期 |
2011.11.29 |
| 申请号 |
US20080076306 |
申请日期 |
2008.03.17 |
| 申请人 |
DE KLERK JOHANNES WILHELMUS;ASML NETHERLANDS B.V. |
发明人 |
DE KLERK JOHANNES WILHELMUS |
| 分类号 |
G03B27/42;G03B27/58 |
主分类号 |
G03B27/42 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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