发明名称 Method for applying a resist layer, uses of adhesive materials, and adhesive materials and resist layer
摘要 A method in which a resist layer is applied to a base layer is disclosed. The resist layer includes an adhesive material, and the adhesive force of the adhesive material decreases or increases during an irradiation process. Residues of the resist layer may be stripped using the disclosed method.
申请公布号 USRE42980(E1) 申请公布日期 2011.11.29
申请号 US20100798150 申请日期 2010.03.29
申请人 KROENINGER WERNER;SCHNEEGANS MANFRED;INFINEON TECHNOLOGIES AG 发明人 KROENINGER WERNER;SCHNEEGANS MANFRED
分类号 G03C11/12;G03F7/16;G03F7/32;G03F7/34;G03F7/42 主分类号 G03C11/12
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