SPUTTER SOURCE, SPUTTERING DEVICE, AND SPUTTERING METHOD,申请号KR20040034361-传众专利搜索

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发明名称	SPUTTER SOURCE, SPUTTERING DEVICE, AND SPUTTERING METHOD
摘要
申请公布号	KR101087525(B1)	申请公布日期	2011.11.28
申请号	KR20040034361	申请日期	2004.05.14
申请人		发明人
分类号	C23C14/34;C23C14/08;C23C14/35;H01J37/34	主分类号	C23C14/34
代理机构		代理人
主权项
地址

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