| 摘要 |
PURPOSE: A photo-mask for manufacturing a color filter is provided to reduce a time and a cost required for color filter manufacturing processes and to increase the aperture ratio of pixels. CONSTITUTION: A photo-mask(M) for manufacturing a color filter includes at least two mask pattern regions corresponding to the color filter region of a transparent substrate. The mask pattern region is a structure(21) in which a plurality of nano-holes(H) of constant diameters and pitches is formed in a light shielding layer. The diameters of the nano holes are between 200 and 450nm. The pitches of adjacent nano holes are between 400 and 900nm. |
