| 摘要 |
A semiconductor processing system includes a common transfer chamber ( 34 ) having first and second compartments ( 46, 48 ) partitioned by a partition wall ( 44 ). First and second vacuum processing apparatuses ( 32 E, 32 A) are respectively connected to the first and second compartments ( 46, 48 ). A pressure control section (PCS) controls the pressures inside the first and second compartments ( 46, 48 ). The pressure control section (PCS) includes first and second vacuum pumps ( 68, 70 ) respectively connected to the first and second compartments ( 46, 48 ), and a line ( 76 ) connecting the delivery side of the second vacuum pump ( 70 ) to the suction side of the first vacuum pump ( 68 ). The pressure control section (PCS) performs a setting such that a second ultimate pressure or lowest operational pressure of the second compartment ( 48 ) is lower than a first ultimate pressure or lowest operational pressure of the first compartment ( 46 ). |
