发明名称 COMPOUND, RESIN, AND RESIST COMPOSITION
摘要 <P>PROBLEM TO BE SOLVED: To provide a new compound, a resin having structural unit originating from the compound, and a resist composition, etc., including the resin. <P>SOLUTION: The compound is represented by formula (I). [L<SP POS="POST">1</SP>represents<SP POS="POST">*1</SP>-O-<SP POS="POST">*2</SP>,<SP POS="POST">*1</SP>-O-CH<SB POS="POST">2</SB>-<SP POS="POST">*2</SP>, or<SP POS="POST">*1</SP>-O-(CH<SB POS="POST">2</SB>)<SB POS="POST">k1</SB>-CO-O-<SP POS="POST">*2</SP>, in the formula.<SP POS="POST">*1</SP>represents a coupling with -CO-, and<SP POS="POST">*2</SP>represents a coupling with Y<SP POS="POST">1</SP>. k1 represents an integer of 1-3. Y<SP POS="POST">1</SP>represents a 4-20C divalent saturated cyclic hydrocarbon. R<SP POS="POST">2</SP>represents a 6-12C aromatic hydrocarbon, wherein hydrogen atoms in the aromatic hydrocarbon may be substituted with a halogen atom, 1-6C alkyl, 1-6C alkoxyl, hydroxyl, carboxyl, nitro, sulfo, 2-7C alkyloxycarbonyl or 2-7C acyl]. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2011236409(A) 申请公布日期 2011.11.24
申请号 JP20110082538 申请日期 2011.04.04
申请人 SUMITOMO CHEMICAL CO LTD 发明人 SUGIHARA MASAKO;YOSHIDA ISAO;SHIMADA MASAHIKO
分类号 C08F20/30;G03F7/039;H01L21/027 主分类号 C08F20/30
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