IMPRINT SYSTEM, IMPRINT METHOD, AND COMPUTER MEMORY MEDIUM

摘要

Disclosed is an imprint system, comprising a substrate processing station for forming a first resist film on a substrate, an imprint processing station connected to the substrate processing station and provided with a plurality of imprint units for forming a second resist film on the substrate formed with the first resist film and transferring a transfer pattern onto the second resist film to form a predetermined resist pattern on the second resist film, a substrate transport station connected to the substrate processing station for transporting a substrate to/from the substrate processing station, and a template transporting station connected to the imprint processing station for transporting a template to/from the imprint processing station.