| 摘要 |
The invention discloses an apparatus for easily stitching a stippling pattern, wherein the stippling pattern 20 is selected and the vertical and lateral lengths XY of an embroidering area 30 are designated. In response to the designation, a pattern number calculating device 4 is operated to calculate the number (integer) of the vertical and lateral lengths of the unit stippling pattern that may be arranged in the embroidering area 30 in alignment vertically and laterally, and then a magnification calculating device is operated to calculate the magnification of the unit stippling pattern respectively of the vertical and lateral lengths of the unit stippling pattern, the calculation being made on the basis of the calculated number of the vertical and lateral lengths of the unit stippling pattern and the size of the embroidering area 30 so that the size of whole pattern may be in accord with the size of the embroidering area 30. In case the calculated magnification is decided as exceeding a predetermined limit value, a warning is indicated so that another unit stippling pattern 20 of different size may be selected. In case the calculated magnification is decided as being not in excess of the predetermined limit value, a stitch data modifying device 6 is operated to enlarge and reduce the stitch data of the pattern on the basis of the calculated magnification rate so that the pattern may be stitched in accordance with the so processed stitch data. |
