发明名称 |
Positive resist composition and resist pattern forming method |
摘要 |
A positive resist composition having excellent size controllability, and a resist pattern forming method are provided. This positive resist composition contains a resin component (A) comprising an alkali soluble constituent unit (a1) which comprises a constituent unit (a11) derived from (α-methyl)hydroxystyrene, and a constituent unit (a2) which has an acid dissociable dissolution inhibiting group including an acid dissociable dissolution inhibiting group (II) represented by the following general formula (II) and/or a specific chain acid dissociable dissolution inhibiting group (III); an acid generator component (B) which generates an acid upon exposure; and preferably contains an aromatic amine (C).
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申请公布号 |
US8062825(B2) |
申请公布日期 |
2011.11.22 |
申请号 |
US20050719179 |
申请日期 |
2005.11.28 |
申请人 |
ANDO TOMOYUKI;HIROSAKI TAKAKO;TOKYO OHKA KOGYO CO., LTD. |
发明人 |
ANDO TOMOYUKI;HIROSAKI TAKAKO |
分类号 |
G03F7/004 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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