发明名称 SEMICONDUCTOR DEVICE MANUFACTURING METHOD
摘要 A transparent board is positioned on a support board provided with a positioning mark, and a release material is provided. A semiconductor element is then positioned so that the electrode element faces upward, and the support board is then removed. An insulating resin is then formed on the release material so as to cover the semiconductor element; and a via, a wiring layer, an insulation layer, an external terminal, and a solder resist are then formed. The transparent board is then peeled from the semiconductor device through the use of the release material. A chip can thereby be mounted with high precision, there is no need to provide a positioning mark during mounting of the chip on the substrate in the manufacturing process, and the substrate can easily be removed. As a result, a semiconductor device having high density and a thin profile can be manufactured at low cost.
申请公布号 US2011281401(A1) 申请公布日期 2011.11.17
申请号 US201113190052 申请日期 2011.07.25
申请人 MORI KENTARO;YAMAMICHI SHINTARO;MURAI HIDEYA;FUNAYA TAKUO;KAWANO MASAYA;MAEDA TAKEHIKO;SOEJIMA KOUJI;C/O RENESAS ELECTRONICS CORPORATION;NEC CORPORATION 发明人 MORI KENTARO;YAMAMICHI SHINTARO;MURAI HIDEYA;FUNAYA TAKUO;KAWANO MASAYA;MAEDA TAKEHIKO;SOEJIMA KOUJI
分类号 H01L21/58 主分类号 H01L21/58
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