发明名称 FILTER, MANUFACTURING METHOD OF FILTER, FLUID JETTING HEAD AND FLUID JETTING APPARATUS
摘要 <P>PROBLEM TO BE SOLVED: To provide a filter which has a high capturing capacity and is small in channel resistance. <P>SOLUTION: The filter which passes a fluid for recording and captures foreign substances present in the fluid has an inflow surface and an outflow surface of the fluid, and is equipped with a substrate in which a plurality of slitlike openings penetrating a space between the inflow surface and the outflow surface are formed. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2011230299(A) 申请公布日期 2011.11.17
申请号 JP20100100020 申请日期 2010.04.23
申请人 SEIKO EPSON CORP 发明人 ONO KATSUNORI;OKUYAMA SHINJI;YOSHIMURA KAZUTO;IGARASHI TOMONORI
分类号 B41J2/175 主分类号 B41J2/175
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