发明名称 |
FILTER, MANUFACTURING METHOD OF FILTER, FLUID JETTING HEAD AND FLUID JETTING APPARATUS |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a filter which has a high capturing capacity and is small in channel resistance. <P>SOLUTION: The filter which passes a fluid for recording and captures foreign substances present in the fluid has an inflow surface and an outflow surface of the fluid, and is equipped with a substrate in which a plurality of slitlike openings penetrating a space between the inflow surface and the outflow surface are formed. <P>COPYRIGHT: (C)2012,JPO&INPIT |
申请公布号 |
JP2011230299(A) |
申请公布日期 |
2011.11.17 |
申请号 |
JP20100100020 |
申请日期 |
2010.04.23 |
申请人 |
SEIKO EPSON CORP |
发明人 |
ONO KATSUNORI;OKUYAMA SHINJI;YOSHIMURA KAZUTO;IGARASHI TOMONORI |
分类号 |
B41J2/175 |
主分类号 |
B41J2/175 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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