METHOD OF MANUFACTURING CRYSTALLINE SILICON SOLAR CELLS USING EPITAXIAL DEPOSITION
摘要
Embodiments of the invention provide a thin single crystalline silicon film solar cell and methods of forming the same. The method includes forming a thin single crystalline silicon layer on a silicon growth substrate, followed by forming front or rear solar cell structures on and/or in the thin single crystalline silicon film. The method also includes attaching the thin single crystalline silicon film to a mechanical carrier and then separating the growth substrate from the thin single crystalline silicon film along a cleavage plane formed between the growth substrate and the thin single crystalline silicon film. Front or rear solar cell structures are then formed on and/or in the thin single crystalline silicon film opposite the mechanical carrier to complete formation of the solar cell.
申请公布号
WO2011143449(A2)
申请公布日期
2011.11.17
申请号
WO2011US36279
申请日期
2011.05.12
申请人
APPLIED MATERIALS, INC.;GEE, JAMES M.;GAY, CHARLES;PATIBANDLA, NAG B.;NALAMASU, OMKARAM;SINGH, KAUSHAL K.
发明人
GEE, JAMES M.;GAY, CHARLES;PATIBANDLA, NAG B.;NALAMASU, OMKARAM;SINGH, KAUSHAL K.