发明名称 Methods, Structures, and Designs for Self-Aligning Local Interconnects used in Integrated Circuits
摘要 An integrated circuit includes a gate electrode level region that includes a plurality of linear-shaped conductive structures. Each of the plurality of linear-shaped conductive structures is defined to extend lengthwise in a first direction. Some of the plurality of linear-shaped conductive structures form one or more gate electrodes of corresponding transistor devices. A local interconnect conductive structure is formed between two of the plurality of linear-shaped conductive structures so as to extend in the first direction along the two of the plurality of linear-shaped conductive structures.
申请公布号 US2011278681(A1) 申请公布日期 2011.11.17
申请号 US201113189433 申请日期 2011.07.22
申请人 SMAYLING MICHAEL C.;BECKER SCOTT T.;TELA INNOVATIONS, INC. 发明人 SMAYLING MICHAEL C.;BECKER SCOTT T.
分类号 H01L27/088 主分类号 H01L27/088
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