| 摘要 |
<P>PROBLEM TO BE SOLVED: To reduce manufacturing costs of an ECR ion source. <P>SOLUTION: This mirror magnetic field generation device 1 of the ECR ion source includes: a plasma chamber 2 which generates plasma to be closed in it; and a mirror magnetic field generation part 3 which generates a mirror magnetic field in which a plurality of regular polygonal or circular permanent magnets 32 are arranged around the plasma chamber 2, and for closing the plasma in the plasma chamber 2 in it by the plurality of permanent magnets 32. Since the mirror magnetic field is generated in the plasma chamber using the permanent magnets with versatility, the mirror magnetic field is simply adjusted by adjusting arrangement and the number of permanent magnets. Namely, it becomes possible to cope with specification change of the ECR ion source without generating permanent magnets with different size or characteristics according to a new specification. As a result, the manufacturing costs are reduced to the specification change of the ECR ion source such as size increase of the plasma chamber. <P>COPYRIGHT: (C)2012,JPO&INPIT |
